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Method for Reducing Surface Electromigration Through Chemical Impurity Optimization Method for Reducing Surface Electromigration Through Chemical Impurity Optimization Disclosure Number 201002439 Technology Summary Many integrated circuit devices such as computer chips rely on interconnects made of copper to electrically join them to a power source and/o…

Plasma-Ionizedgas Plasma/Ionized Gas Impurity Sensor The Impurity Filterscope for measuring visible light emission from plasmas and ionized gases The filterscope is a diagnostic for monitoring visible light emission from plasmas and other ionized gases. Light from a plasma is conducted to the filterscope via optical fibers. This light is split into multiple paths, and optical bandpass filters in…

Normal state magnetic behavior of (U/sub 1-x/RE/sub x/)Be/sub 13/ pseudobinaries A major purpose of the Techni- cal Information Center is to provide the broadest dissemination possi- ble of information contained in DOE s Research and Development Reports to business, industry, the academic community, and federal, state and local governments. Although a small portion of this report is not …

Theoretical studies of shock dynamics in two-dimensional structures. V. Microscopic constraints on shock-induced signals THEORETICAL STUDIES OF SHOCK DYNAMICS IN TWO-DIMENSIONAL STRUCTURES, V. MICROSCOPIC CONSTRAINTS ON SHOCK-INDUCED SIGNALS* A. M. Karo, F. E, Walker, and W. 6. Cunningham Lawrence Livermore National Laboratory Livermore, California 94550 J. R. Hardy University of Nebr…

: Shock Load, system, Atom...

A survey of reflectometry techniques with applications to TFTR GTFR-112 A SURVEY OF REFLECTOMETRY TECHNIQUES WITH APPLICATIONS TO TFTR Ivan Collazo, John Wilgen* Greg Hanson*, Tim Bigelow* Norton Bretz, t W.M. Stacey, C. E. Thomas* Fusion Research Center and Nuclear Engineering Program Georgia Institute of Technology Atlanta, GA 30332 USA December, 1993 *Oak Ridge National Laboratory …

: model, Dielectric, Energy...

Overview of impurity control and wall conditioning in NSTX Overview of Impurity Control and Wail Conditioning in NSTX H.W. Kugela, R. Maingib, M. Bella, W. Blancharda, D. Gatesa, D. Johnsona, R. Kaitaa, S. Kayea, R. Maquedac, J. Menarda, D. Muellera, M. Onoa, Y-K. M. Pengb, R. Ramana, A. Ramseya, A. Roquemorea, C. Skinnera, S.Sabbaghe, D. Stutmanf, W. Wamplerg, 4$)$ J. R. Wilsona, S. Zwebena,…

Overview of impurity control and wall conditioning in NSTX PPPL-3469 PPPL-3469 UC-70 Overview of Impurity Control and Wall Conditioning in NSTX by H.W. Kugel, R. Maingi, W. Wampler, R.E. Berry, M. Bell, W. Blanchard, D. Gates, D. Johnson, R. Kaita, S. Kaye, R. Maqueda, J. Menard, M.M. Menon, D. Mueller, M. Ono, S. Paul, Y-K. M. Peng, R. Raman, A. Roquemore, C.H. Skinner, S. Sabbagh, B. Str…

Users manual for the UEDGE edge-plasma transport code LAWRENCE N AT I O N A L LABORATORY LIVERMORE UCRL-ID-137121 January 10, 2000 T.D. Rognlien, M.E. Rensink, G.R. Smith Users Manual for the UEDGE Edge-Plasma Transport Code This document was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor…

: Plasma, Simulation, code...

Temperature dependent 5f-states in URu2Si2 Temperature Dependent 5f-states in URu2Si2 J. D. Denlinger a,* G.-H. Gweon b J. W. Allen b J. L. Sarrao c aAdvanced Light Source, Lawrence Berkeley Nat l Lab, Berkeley, CA 94720, USA bRandall Lab. of Physics, Univ. of Michigan, Ann Arbor, MI 48109-1120, USA cLos Alamos National Laboratory, Los Alamos, NM 87545, USA Abstract A dramatic temperature d…

: model, Weight, Electron...

Economic manufacturing of bulk metallic glass compositions by microalloying Description FIELD OF THE INVENTION The present invention relates to methods of manufacturing bulk metallic glass compositions, and more particularly to such methods that involve microalloying with impurity-mitigating dopants. BACKGROUND OF THE INVENTION Bulk metallic glasses (BMGs) constitute a new clas…

: Patents
: UT, Battelle LLC
: Silicon, Glass, Metal...
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